JPH0363573U - - Google Patents
Info
- Publication number
- JPH0363573U JPH0363573U JP12338189U JP12338189U JPH0363573U JP H0363573 U JPH0363573 U JP H0363573U JP 12338189 U JP12338189 U JP 12338189U JP 12338189 U JP12338189 U JP 12338189U JP H0363573 U JPH0363573 U JP H0363573U
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- reaction chamber
- entrance
- exit
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12338189U JPH0627651Y2 (ja) | 1989-10-20 | 1989-10-20 | 膜形成用反応装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12338189U JPH0627651Y2 (ja) | 1989-10-20 | 1989-10-20 | 膜形成用反応装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0363573U true JPH0363573U (en]) | 1991-06-20 |
| JPH0627651Y2 JPH0627651Y2 (ja) | 1994-07-27 |
Family
ID=31671362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12338189U Expired - Lifetime JPH0627651Y2 (ja) | 1989-10-20 | 1989-10-20 | 膜形成用反応装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0627651Y2 (en]) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013539209A (ja) * | 2010-08-02 | 2013-10-17 | ビーコ・インストゥルメンツ・インコーポレイテッド | Ｃｖｄ反応器用の排気システム |
| US9388493B2 (en) | 2013-01-08 | 2016-07-12 | Veeco Instruments Inc. | Self-cleaning shutter for CVD reactor |
| US9938621B2 (en) | 2010-12-30 | 2018-04-10 | Veeco Instruments Inc. | Methods of wafer processing with carrier extension |
-
1989
- 1989-10-20 JP JP12338189U patent/JPH0627651Y2/ja not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013539209A (ja) * | 2010-08-02 | 2013-10-17 | ビーコ・インストゥルメンツ・インコーポレイテッド | Ｃｖｄ反応器用の排気システム |
| US9938621B2 (en) | 2010-12-30 | 2018-04-10 | Veeco Instruments Inc. | Methods of wafer processing with carrier extension |
| US10167554B2 (en) | 2010-12-30 | 2019-01-01 | Veeco Instruments Inc. | Wafer processing with carrier extension |
| US9388493B2 (en) | 2013-01-08 | 2016-07-12 | Veeco Instruments Inc. | Self-cleaning shutter for CVD reactor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0627651Y2 (ja) | 1994-07-27 |